Magnetron Sputtering Process System

technical parameter Technical Parameter:

 The entire production line is equipped with many sputtering cathode units according to actual requirements. In production, each vacuum sputtering cathode unit must be added with working gas. According to the type of target material, the air supply channel selects one or two of the three gases Ar, O2, and N2 through the electromagnetic valve, and uses the gas mass flowmeter to control the flow of the selected gas, assisting air supply channel to select one of the three gases Ar, O2, and N2 gas through the electromagnetic valve. The gas flow controller adopts Bronkhost’s latest integrated control structure and uses Devicnet communication method to implement the setting and display of control parameters.
      Each cathode power supply adopts control method of Devicenet fieldbus interface to control all operation, parameter setting and data exchange of cathode power supply. The control system has remote control on the cathode and cathode power supply selected by the user, and sets the production process control parameters(such as cathode voltage, current, power, operating state, failure situation, etc.) according to the product. It receives feedback signals to carry out safety interlocking and process control, monitors running status, makes records and prints parameters and curves.
The system automatically identify each cathode unit, automatically displays the cathode unit connected to the output of the current cathode power supply and the working target material on the operator station computer, and then automatically controls the cathode unit accordingly, and at the same time performs safety interlocking. When the line of cathode power output line is not connected to the cathode unit or the cooling conditions are not available to work, the system will forbid the work of that cathode power supply.